Comparison of Scalar and Vector Modeling of Image Formation in Photoresist
نویسندگان
چکیده
A comparison is made between several scalar models for the formation of an image in a photoresist film with differing approximations and a vector model. It was found that up to numerical apertures of 0.7, a full scalar model showed no appreciable deviation from the vector model. However, when several common assumptions were made to simplify the scalar model, significant errors resulted at the higher numerical apertures.
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